Editor’s Note: “Importance of Monomer Interfacial Tension for UV Curable Litho Inks Performance” was presented during the 2002 RadTech Technical Conference in Indianapolis, IN. ©2002, RadTech International North America, Inc. Reprinted with permission from the RADTECH 2002 Conference Proceedings. For many years, the goal of ink makers is to improve the runnability and lithographic behavior, dot gain, cure speed and odor for UV offset inks. Unfortunately, the formulation of UV curable printing i...